发明名称 |
Apparatus and method for interlocking a power supply to ion implantation equipment, method and apparatus for generating an interlocking signal, method and apparatus for interrupting an ion implantation process, and an interlocking system |
摘要 |
An apparatus and a method for interlocking power to ion implantation equipment. The apparatus may include a positive and a negative power supply which generates a positive voltage and a negative voltage respectively, a comparator which compares the positive voltage and the negative voltage, and a signal generating unit which generates an interlocking signal which interlocks the positive and negative power supplies when a sum of a first relative value of the positive voltage and a second relative value of the negative voltage does not equal zero. The apparatus may further include a switching unit which changes a mode of the positive and negative power supplies from a remote mode to a local mode when the sum of the relative values does not equal zero. The switching unit may be a relay switch. Power output lines may connect the positive and negative power sources to a lens assembly unit.
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申请公布号 |
US7115490(B2) |
申请公布日期 |
2006.10.03 |
申请号 |
US20030423943 |
申请日期 |
2003.04.28 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO YEON-HA |
分类号 |
H01L21/04;H01J37/317 |
主分类号 |
H01L21/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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