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发明名称
Geïntegreerde optische metrologie en lithografische proceslijn voor dynamische kritieke dimensieregeling.
摘要
申请公布号
NL2000045(A1)
申请公布日期
2006.10.03
申请号
NL20062000045
申请日期
2006.03.31
申请人
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
发明人
CHIH-MING KE;SHINN-SHENG YU;YU-HSI WANG;TSAI-SHENG GAU;JACKY HUANG
分类号
H01L21/027;(IPC1-7):H01L21/027
主分类号
H01L21/027
代理机构
代理人
主权项
地址
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