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发明名称
制造快闪记忆体装置之方法
摘要
一种用以制造快闪记忆体装置之方法,其包含以下步骤:(a)在一半导体基板之预定区域上形成浮动闸极图案;(b)在该半导体基板之一包含该等浮动闸极图案之预定区域上形成一层间介电膜;(c)在整个表面上 积一用于一控制闸极之多晶矽膜;(d)藉由一化学溅镀过程回蚀该用于控制闸极之多晶矽膜之表面;及(e)在该用于控制闸极之多晶矽膜上形成一钨膜。
申请公布号
TW200634995
申请公布日期
2006.10.01
申请号
TW094120683
申请日期
2005.06.21
申请人
海力士半导体股份有限公司
发明人
安明圭
分类号
H01L21/8247;H01L21/461
主分类号
H01L21/8247
代理机构
代理人
陈长文
主权项
地址
韩国
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