发明名称 MONITORING OF CLEANING PROCESS
摘要 A method for monitoring a cleaning process for a medical instrument, include s the steps of placing the instrument in a cleaning chamber; placing a soil standa rd in the cleaning chamber; cleaning the instrument and the soil standard with a cleaning solution; and detecting whether soil remains on said soil standard. The soil standard includes two substantially parallel substrates separated with two substantially equal thickness spacers, wherein a gap is formed between the two substrates with soil in the gap.</SD OAB>
申请公布号 CA2541480(A1) 申请公布日期 2006.09.30
申请号 CA20062541480 申请日期 2006.03.29
申请人 ETHICON, INC. 发明人 LIN, SZU-MIN;WANG, JENN-HANN;JACOBS, PAUL T.;ZHU, PETER C.;PLATT, ROBERT C.
分类号 A61L2/28;A61L2/26 主分类号 A61L2/28
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