发明名称 |
MONITORING OF CLEANING PROCESS |
摘要 |
A method for monitoring a cleaning process for a medical instrument, include s the steps of placing the instrument in a cleaning chamber; placing a soil standa rd in the cleaning chamber; cleaning the instrument and the soil standard with a cleaning solution; and detecting whether soil remains on said soil standard. The soil standard includes two substantially parallel substrates separated with two substantially equal thickness spacers, wherein a gap is formed between the two substrates with soil in the gap.</SD OAB> |
申请公布号 |
CA2541480(A1) |
申请公布日期 |
2006.09.30 |
申请号 |
CA20062541480 |
申请日期 |
2006.03.29 |
申请人 |
ETHICON, INC. |
发明人 |
LIN, SZU-MIN;WANG, JENN-HANN;JACOBS, PAUL T.;ZHU, PETER C.;PLATT, ROBERT C. |
分类号 |
A61L2/28;A61L2/26 |
主分类号 |
A61L2/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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