| 摘要 |
A POLISHING COMPOSITION FOR A SUBSTRATE TO BE USED FOR A MEMORY HARD DISK, WHICH COMPRISES THE FOLLOWING COMPONENTS (A) TO (D): @(A) WATER, (B) AT LEAST ONE COMPOUND SELECTED FROM THE GROUP CONSISTING OF POLYOXYETHYLENE POLYOXYPROPYLENE ALKYL ETHER AND A POLYOXYETHYLENE POLYOXYPROPYLENE COPOLYMER, (C) AT LEAST ONE COMPOUND SELECTED FROM THE GROUP CONSISTING OF NITRIC ACID, NITROUS ACID, SULFURIC ACID, HYDROCHLORIC ACID, MOLYBDIC ACID, SULFAMIC ACID, GLYCINE, GLYCERIC ACID, MANDELIC ACID, MALONIC ACID, ASCORBIC ACID, GLUTAMIC ACID, GLYOXYLIC ACID, MALIC ACID, GLYCOLIC ACID, LACTI C ACID, GLUCONIC ACID, SUCCINIC ACID, TARTARIC ACID, MALEIC ACID AND CIRTRIC ACID, AND THEIR SALTS, AND (D) AT LEAST ONE ABRASIVE SELECTED FROM THE GROUP CONSISTING OF ALUMINUM OXIDE, SILICON DIOXIDE, CERIUM OXIDE, ZIRCONIUM OXIDE, TITANIUM OXIDE, SILICON NITRIDE AND SILICON CARBIDE. |
