发明名称 MICRO-STRUCTURE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a micro-structure having high durability and a manufacturing method thereof capable of manufacturing the micro-structure at a good yield. SOLUTION: This micro-structure includes: a substrate 11; a layered part 20 including a multilayer film 14 disposed on the substrate 11; and a raised part 30 formed by bending the multilayer film 14 at the bending part A. The multilayer film 14 includes a plurality of semiconductor layers 14a and 14b different in lattice constants, and the multilayer film 14 is bent by a force generated due to a difference in the lattice constant between the plurality of semiconductor layers 14a and 14b. The multilayer film 14 in the bending part A is formed with a plurality of grooves 14h extending in the direction parallel to the bending direction of the bending part A. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006255864(A) 申请公布日期 2006.09.28
申请号 JP20050080210 申请日期 2005.03.18
申请人 ADVANCED TELECOMMUNICATION RESEARCH INSTITUTE INTERNATIONAL 发明人 ALEXANDER CHEHOVSKIY;NETHAJI DHARMARASU;SAITO NOBUO;PABLO VACCARO
分类号 B81B1/00;B81C1/00 主分类号 B81B1/00
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