发明名称 |
MICRO-STRUCTURE AND MANUFACTURING METHOD THEREOF |
摘要 |
PROBLEM TO BE SOLVED: To provide a micro-structure having high durability and a manufacturing method thereof capable of manufacturing the micro-structure at a good yield. SOLUTION: This micro-structure includes: a substrate 11; a layered part 20 including a multilayer film 14 disposed on the substrate 11; and a raised part 30 formed by bending the multilayer film 14 at the bending part A. The multilayer film 14 includes a plurality of semiconductor layers 14a and 14b different in lattice constants, and the multilayer film 14 is bent by a force generated due to a difference in the lattice constant between the plurality of semiconductor layers 14a and 14b. The multilayer film 14 in the bending part A is formed with a plurality of grooves 14h extending in the direction parallel to the bending direction of the bending part A. COPYRIGHT: (C)2006,JPO&NCIPI
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申请公布号 |
JP2006255864(A) |
申请公布日期 |
2006.09.28 |
申请号 |
JP20050080210 |
申请日期 |
2005.03.18 |
申请人 |
ADVANCED TELECOMMUNICATION RESEARCH INSTITUTE INTERNATIONAL |
发明人 |
ALEXANDER CHEHOVSKIY;NETHAJI DHARMARASU;SAITO NOBUO;PABLO VACCARO |
分类号 |
B81B1/00;B81C1/00 |
主分类号 |
B81B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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