| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a device and a method of preventing zeroth leak from causing variation in strength of light exposing photoresist. <P>SOLUTION: A photographic system 1500 is provided with an irradiation source 102 that can make light penetrate a phase shift mask 112, a first adjusting lens 104 that can make the light from the phase shift mask focus on a pupil side, a shielding aperture 1502 that is substantially located inside the pupil side and can shield a part of the light, and a second adjusting lens 106 that can re-direct the light from the pupil side to the photoresist. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
