| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner capable of preventing deformation of a liquid crystal mask due to an increase in temperature of the liquid crystal mask in exposure processing, and to provide an electrooptical apparatus. <P>SOLUTION: The aligner 70 uses the liquid crystal mask to transfer a predetermined pattern to a substrate 1 to be exposed. The apparatus 70 is provided with a light source 5 for emitting an exposure light, and cooling means 90 for cooling the liquid crystal mask 8 irradiated with the exposure light from the light source 5. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
