发明名称 |
METHOD OF FORMING FILM PATTERN, METHOD OF MANUFACTURING DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of forming a film pattern which is capable of consistently forming a fine film pattern with high performance. <P>SOLUTION: The method of forming a film pattern by disposing a functional liquid on a substrate includes: a bank forming step S1 of forming banks corresponding to the film pattern on the substrate; an irregularity forming step S4 of forming irregularities on bottoms between the banks by using the banks as a mask; and a material disposing step S5 of disposing the functional liquid between the banks and on the bottoms formed with the irregularities. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
申请公布号 |
JP2006259687(A) |
申请公布日期 |
2006.09.28 |
申请号 |
JP20050328485 |
申请日期 |
2005.11.14 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SAKASHITA YUKI;MORIYA KATSUYUKI;HIRAI TOSHIMITSU |
分类号 |
G09F9/00;G02F1/1343 |
主分类号 |
G09F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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