发明名称 METHOD OF FORMING FILM PATTERN, METHOD OF MANUFACTURING DEVICE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of forming a film pattern which is capable of consistently forming a fine film pattern with high performance. <P>SOLUTION: The method of forming a film pattern by disposing a functional liquid on a substrate includes: a bank forming step S1 of forming banks corresponding to the film pattern on the substrate; an irregularity forming step S4 of forming irregularities on bottoms between the banks by using the banks as a mask; and a material disposing step S5 of disposing the functional liquid between the banks and on the bottoms formed with the irregularities. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2006259687(A) 申请公布日期 2006.09.28
申请号 JP20050328485 申请日期 2005.11.14
申请人 SEIKO EPSON CORP 发明人 SAKASHITA YUKI;MORIYA KATSUYUKI;HIRAI TOSHIMITSU
分类号 G09F9/00;G02F1/1343 主分类号 G09F9/00
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