发明名称 ION SOURCE AND APERTURE FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To improve plasma generation efficiency and ion draw-out efficiency by ameliorating a shape of a micro aperture for blasting raw gas in high pressure and an aperture for drawing out ion. SOLUTION: In the ion source X1 so structured that, by impressing voltage between an anode electrode 2a with a micro aperture 9a fitted and a cathode electrode 5a with an ion-draw-out aperture 52a fitted, the raw gas is blasted in high pressure from the micro aperture 9a toward the ion-draw-out aperture 52a, and the blasted raw gas is plasmolyzed and at the same time, ion is drawn out from the ion-draw-out aperture 52a, the micro aperture 9a is formed in a tapered shape toward a direction of high-pressure blasting of the raw gas. Further, the ion-draw-out aperture 52a is formed broadened toward a direction in which ion is drawn out. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006260880(A) 申请公布日期 2006.09.28
申请号 JP20050074800 申请日期 2005.03.16
申请人 KYOTO UNIV;KOBE STEEL LTD 发明人 GOTO YASUHITO;ISHIKAWA JUNZO;ICHIHARA CHIKARA;KOBAYASHI AKIRA;HIRANO TAKAYUKI
分类号 H01J27/02;H01J9/02;H01J37/08 主分类号 H01J27/02
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