| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a holographic grating by which a desired saw-tooth wave pattern can stably be produced. SOLUTION: In a 1st stage, (a) a substrate 2 is coated with a photoresist film 1 and (b) a pattern of photoresist 1a in a sine half-wave shape is formed on the substrate 2 by using a holographic exposure device. In a 2nd stage, (c) the substrate is vertically irradiated with an ion beam by CF4 gas and (d) the substrate 2 is ruled until the photoresist 1a completely disappears to form a pattern in a sine half-wave shape. In a 3rd stage, (e) the substrate is obliquely irradiated with an Ar ion beam, and (f) the substrate 2 is etched; and (g) the substrate is ruled in a desired saw-tooth wave shape and (h) the substrate 2 is coated with an Al film 3 as a reflecting film through vapor deposition. COPYRIGHT: (C)2006,JPO&NCIPI
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