发明名称 Perforation and grooving for polishing articles
摘要 Methods, articles of manufacture, and apparatus are provided for depositing and planarizing one or more layers of material on a substrate, or combinations thereof, are disclosed. In one embodiment, an article of manufacture is provided for polishing a substrate, comprising a polishing article having a polishing surface, a plurality of perforations formed in at least a portion of the polishing article for flow of material therethrough, and a plurality of grooves disposed in the polishing surface. The article of manufacture may be used in a method for processing a substrate, comprising positioning the substrate in an electrolyte solution containing a polishing article, optionally depositing a material on the substrate by an electrochemical deposition method, and polishing the substrate with the polishing article.
申请公布号 US2006217049(A1) 申请公布日期 2006.09.28
申请号 US20060418557 申请日期 2006.05.05
申请人 APPLIED MATERIALS, INC. 发明人 LI SHIJIAN;CHEN LIANG-YUH;DUBOUST ALAIN
分类号 H01L21/306;B23H5/08;B24B37/04;B24B57/02;B24D11/00;B24D13/14 主分类号 H01L21/306
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