| 摘要 |
PROBLEM TO BE SOLVED: To provide an atmospheric carrying chamber in which the quality of a semiconductor device manufactured of an article to be treated can be prevented from deteriorating, and the rate of the operation of article treatment equipment can be enhanced. SOLUTION: A loader module 13 for carrying an etched wafer W incorporates an FFU 34 arranged on the upper side wherein the FFU 34 is composed of a fan unit 37, a heating unit 38, a dehumidification unit 39 and a dust removing unit 40. The fan unit 37 incorporates a fan for delivering an atmosphere toward the lower side, the dehumidification unit 39 incorporates a desiccant filter 55 for dehumidifying the atmosphere delivered by the fan unit 37, and the dust removing unit 40 incorporates a filter for collecting dust in the atmosphere passed through the dehumidification unit 39. Consequently, the FFU 34 supplies the atmosphere introduced to the upper side in the loader module 13 to the lower side in the loader module 13 while heating, dehumidifying and removing dust. COPYRIGHT: (C)2006,JPO&NCIPI
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