| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a high-dielectric material suitable as a raw material for manufacturing a sputtering target having a uniform structure, a high density, and high strength, which is used for forming a high-dielectric film, and its manufacturing method. <P>SOLUTION: The method contains the following processes: (1) a first process where a powder of a compound of at least one kind of elements selected from barium, strontium, and calcium and a titanium oxide powder are used as raw material powders and a mixed powder prepared by mixing them is calcined, (2) a second process where the calcined powder is wet-disintegrated and a calcined powder slurry with a particle size distribution controlled to have a particle diameter of the cumulative particle size distribution at 90 wt% of ≤3 μm and a particle diameter of the cumulative particle size distribution at 50 wt% of ≤2 μm is obtained, (3) a third process where the calcined powder slurry is vacuum-filtered and the obtained powder is washed by adding pure water and vacuum-filtered again, to obtain a powder from which impure elements are removed by washing, and (4) a fourth process where the powder is dry-pelletized, to obtain a complex oxide powder. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
