发明名称 |
Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
摘要 |
Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
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申请公布号 |
US2006216939(A1) |
申请公布日期 |
2006.09.28 |
申请号 |
US20060435092 |
申请日期 |
2006.05.17 |
申请人 |
UCHIDA TAKESHI;HOSHINO TETSUYA;TERAZAKI HIROKI;KAMIGATA YASUO;KOYAMA NAOYUKI;HONMA YOSHIO;KONDOH SEIICHI |
发明人 |
UCHIDA TAKESHI;HOSHINO TETSUYA;TERAZAKI HIROKI;KAMIGATA YASUO;KOYAMA NAOYUKI;HONMA YOSHIO;KONDOH SEIICHI |
分类号 |
H01L21/461;B24B37/00;C09G1/02;C09K13/00;C23F3/00;H01L21/321 |
主分类号 |
H01L21/461 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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