发明名称 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
摘要 Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
申请公布号 US2006216939(A1) 申请公布日期 2006.09.28
申请号 US20060435092 申请日期 2006.05.17
申请人 UCHIDA TAKESHI;HOSHINO TETSUYA;TERAZAKI HIROKI;KAMIGATA YASUO;KOYAMA NAOYUKI;HONMA YOSHIO;KONDOH SEIICHI 发明人 UCHIDA TAKESHI;HOSHINO TETSUYA;TERAZAKI HIROKI;KAMIGATA YASUO;KOYAMA NAOYUKI;HONMA YOSHIO;KONDOH SEIICHI
分类号 H01L21/461;B24B37/00;C09G1/02;C09K13/00;C23F3/00;H01L21/321 主分类号 H01L21/461
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