| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition excellent in sensitivity, resolution and defocus latitude (DOF), for use in a manufacturing process of a semiconductor such as an IC or for manufacturing a circuit board of a liquid crystal, a thermal head or the like, and to provide a compound for use in the photosensitive composition, and a pattern forming method using the photosensitive composition. <P>SOLUTION: The composition contains a compound expressed by general formula (I). In formula (I), each of Ar<SB>1</SB>to Ar<SB>3</SB>represents an aromatic ring and having a group expressed by -Q-SO<SB>2</SB>Ra or -Q-CORb as a substituent, wherein each of Ra and Rb represents an alkyl group or an aryl group and Q represents an oxygen atom or -N(Ry)-; X represents a single bond or a divalent linking group; and Y represents an anion. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
