| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive coloring composition with which no scum (floating residue) is produced on a pixel, and a highly precise pattern comforming to a mask design is formed with high sensitivity, and which is also excellent in adhesion strength to a substrate and so on. <P>SOLUTION: In the photosensitive coloring composition containing a coloring agent, an alkali soluble resin, a photopolymerization initiator, a reactive monomer, and an organic solvent as components, a fluorene structure containing bifunctional monomer with a specified structure is used as the reactive monomer. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
