发明名称 Lithographic apparatus and device manufacturing method
摘要 A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
申请公布号 US2006215134(A1) 申请公布日期 2006.09.28
申请号 US20050086667 申请日期 2005.03.23
申请人 ASML NETHERLAND B.V. 发明人 BUURMAN ERIK P.;CASTENMILLER THOMAS J.M.;TEEUWSEN JOHANNES WILHELMUS M.C.;MOEST BEARRACH;HAAST MARE A.M.
分类号 G03F7/20 主分类号 G03F7/20
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