发明名称 ELECTRODE STRUCTURE OF PLASMA SURFACE PROCESSOR
摘要 <P>PROBLEM TO BE SOLVED: To provide the electrode structure of a plasma surface processor which can prevent an abnormal electric discharge in a corner made from the end face of an electrode and the extended part of a dielectric member. <P>SOLUTION: The plasma space forming surface of the electrode 11 of the plasma surface processor is covered with the dielectric member 13 as a solid dielectric layer. This dielectric member 13 is made to extend from the plasma space forming surface of the electrode 11. An electric field spread member 40 of high dielectric constant is made from the corner C which is made from the extended part 13a and the end face of the electrode 11. The electric field in the corner C is diffused in this electric field spread member 40, and the abnormal electric discharge is inhibited. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006261017(A) 申请公布日期 2006.09.28
申请号 JP20050079069 申请日期 2005.03.18
申请人 SEKISUI CHEM CO LTD 发明人 UMEOKA TAKASHI;YASHIRO SUSUMU
分类号 H05H1/24;C23C16/50;H01L21/304 主分类号 H05H1/24
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