| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive type photosensitive resin composition which has excellent heat resistance and transparency. <P>SOLUTION: The photosensitive resin composition contains a resin component (A1) which has a structural unit, expressed by a formula (a1'), based on a structural unit expressed by a formula (a1), of which at least a part of hydrogen atoms of phenolic hydroxyl groups is substituted with a naphthoquinone-1,2-diazide-5- (and/or -4-) sulfonyl group. In the formula, R<SP>0</SP>represents a hydrogen atom or a methyl group, R<SP>1</SP>represents a single bond or a 1-5C alkylene group, R<SP>2</SP>represents a 1-5C alkyl group, a represents an integer of 1-5, b represents 0 or an integer of 1-4, and a+b is 5 or less. In addition, in the case two or more R<SP>2</SP>exist, these R<SP>2</SP>are optionally different from one another or identical. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
