ENHANCED DEPOSITION OF NOBLE METAL BY ALD

摘要

PROBLEM TO BE SOLVED: To provide a process for stably depositing a film including a noble metal on a substrate using a chemical vapor deposition method. SOLUTION: The method for depositing a film including a noble metal on the substrate in a reaction chamber comprises treatment with a hydrogen halide or gaseous halide of a metal halide or an organometallic compound and depositing a film including a noble metal reaction product and the noble metal derived from an oxygen-containing reaction product by using an atomic layer deposition process which is a vapor deposition process. COPYRIGHT: (C)2006,JPO&NCIPI