METHOD FOR PRODUCING PHOTOLITHOGRAPHY PATTERNING DEVICE, COMPUTER PROGRAM, PATTERNING DEVICE, METHOD FOR DETERMINING POSITION OF TARGET IMAGE ON OR NEAR SUBSTRATE, MEASURING DEVICE, AND LITHOGRAPHY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method for producing a photolithography patterning device, and a lithography device using the method.

SOLUTION: Target dimensions and orientations are defined at the stage of creating a patterning device, and the effective shadow angle of the radiation is calculated at a plurality of points. Based on this, the thickness of the absorber layer or the intensity attenuation of the absorber of the patterning device is adjusted so as to compensate the displacement and the dimension errors of the desired image. The lithography device is a projection and exposure device using the patterning device. It is equipped with a measuring device used for determining the target position of the image, and composed so that the position and the dimension errors of the target image can be compensated for, corresponding to the result of the detection by the detector.

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