| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a dielectric thin film where, even without machining or polishing the surface of a dielectric thin film deposited by an aerosol deposition process, a smooth surface can be obtained. SOLUTION: A first dielectric thin film is deposited on a base material by an aerosol deposition process. Thereafter, on the first dielectric thin film, a second dielectric thin film is deposited by a chemical solution process, or a second dielectric thin film is deposited by a CVD (Chemical Vapor Deposition) process, a sputtering process, a laser ablation process, a hydrothermal synthesis process or a doctor blade process. Alternatively, after a dielectric thin film is deposited on a base material by an aerosol deposition process, the surface of the dielectric thin film is subjected to wet etching, so as to appear a surface whose smoothness is improved. COPYRIGHT: (C)2006,JPO&NCIPI
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