发明名称 PHOTON SOURCE COMPRISING AN ELECTRON CYCLOTRON RESONANCE MULTICHARGED ION PLASMA SOURCE
摘要 The invention relates to a photon source comprising an electron cyclotron resonance (ECR) multicharged ion plasma source which comprises a cylindrical plasma vacuum chamber (CH) , an injection guide (GD) for injecting microwaves into the chamber, a device (I) for injecting a gas into the chamber, a pumping system (P) to extract ionised gas resulting from the action of microwaves on the gas (g) , and a cylindrical magnetic structure (1, 2, 3a, 3b, 4) that surrounds the chamber (CH) and that produces at least two closed surfaces (S) in line along the chamber axis and on which the value of the magnetic field is equal to the value of the electron cyclotron resonance field (ECR) , the photons being extracted through an opening (02) in line along the axis of the chamber .
申请公布号 WO2006100217(A1) 申请公布日期 2006.09.28
申请号 WO2006EP60862 申请日期 2006.03.20
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE;DELAUNAY, MARC;HITZ, DENIS 发明人 DELAUNAY, MARC;HITZ, DENIS
分类号 H05G2/00;H05H1/11;H05H1/16 主分类号 H05G2/00
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