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发明名称
Method for etching silicon dioxide using fluorocarbon gas chemistry
摘要
申请公布号
KR100628932(B1)
申请公布日期
2006.09.27
申请号
KR20007012293
申请日期
2000.11.04
申请人
发明人
分类号
H01L21/311
主分类号
H01L21/311
代理机构
代理人
主权项
地址
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