发明名称 Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby
摘要 A radiation system includes a radiation generator to generate radiation, a source, and an illumination system configured to receive the radiation and provide a beam of radiation. The illumination system includes a beam measuring system configured measure at least one of position and tilt of the beam of radiation relative to the illumination system and a projecting device configured to redirect only a part of a cross section of the beam of radiation to the beam measuring system. The beam measuring system may include several position sensors, the readouts of which can be used to determine incorrect alignment of the radiation source with respect to the illumination system. Diaphragms are connected to the collector of the radiation generator, so that in addition to X, Y, and Z corrections, Rx, Ry and Rz corrections are possible.
申请公布号 US7113261(B2) 申请公布日期 2006.09.26
申请号 US20040862819 申请日期 2004.06.08
申请人 ASML NETHERLANDS B.V. 发明人 DIERICHS MARCEL MATHIJS THEODORE MARIE;EURLINGS MARKUS FRANCISCUS ANTONIUS;FRIJNS OLAV WALDEMAR VLADIMIR;VOORMA HARM-JAN
分类号 G01B11/00;G03B27/74;G01B11/26;G02B5/08;G03B27/42;G03B27/68;G03F7/20;H01L21/027 主分类号 G01B11/00
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