发明名称 Semiconductor device and manufacturing method of the same
摘要 An aspect of the present invention provides a semiconductor device that includes a first transistor including a source region, a drain region provided in the same device region as the source region, and a loop-shaped gate electrode region, and a second transistor sharing, with the first transistor, the loop-shaped gate electrode region and the source region or the drain region.
申请公布号 US7112858(B2) 申请公布日期 2006.09.26
申请号 US20040799780 申请日期 2004.03.15
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 INABA SATOSHI;FUJIWARA MAKOTO
分类号 H01L29/423;H01L29/94;H01L21/28;H01L21/8238;H01L27/02;H01L27/07;H01L27/08;H01L27/092;H01L27/11;H01L27/12;H01L27/148;H01L29/41;H01L29/49;H01L29/786;H01L31/062 主分类号 H01L29/423
代理机构 代理人
主权项
地址
您可能感兴趣的专利