发明名称 Semiconductor capacitor with praseodymium oxide as dielectric
摘要 In accordance with the invention there is provided a semiconductor capacitor having a first semiconductor layer which forms a first capacitor electrode and which includes silicon, a second capacitor electrode and a capacitor dielectric including praseodymium oxide between the capacitor electrodes, in which provided between the capacitor dielectric including praseodymium oxide and at least the first semiconductor layer including silicon is a first thin intermediate layer representing a diffusion barrier for oxygen. In particular the thin intermediate layer can include oxynitride.
申请公布号 US7113388(B2) 申请公布日期 2006.09.26
申请号 US20040511777 申请日期 2004.10.18
申请人 MICROELECTRONICS/INSTITUTE FUR INNOVATIVE MIKROELEKTRONIK 发明人 MUESSIG HANS-JOACHIM
分类号 H01G4/228;H01G4/06;H01G4/12;H01G4/30;H01L21/02;H01L21/316;H01L21/822;H01L27/08 主分类号 H01G4/228
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