发明名称 |
Pretreatment for an electroplating process and an electroplating process in including the pretreatment |
摘要 |
The present invention provides an electroplating process and a method for manufacturing an integrated circuit. The electroplating process includes, among other steps, placing a substrate 290 in an enclosure 200 being substantially devoid of unwanted contaminants and forming a material layer 310 over the substrate 290 within the enclosure 200, the enclosure 200 still being substantially devoid of the unwanted contaminants. The electroplating process further includes forming a thin layer of oxide 410 over the material layer 310 within the enclosure 200 , the enclosure 200 still being substantially devoid of the unwanted contaminants during the forming the thin layer of oxide 410.
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申请公布号 |
US7112540(B2) |
申请公布日期 |
2006.09.26 |
申请号 |
US20040766491 |
申请日期 |
2004.01.28 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
GULDI RICHARD L.;RAMAPPA DEEPAK |
分类号 |
H01L21/31;H01L21/44;H01L21/768;H01L23/52 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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