Lithographic apparatus, device manufacturing method, and device manufactured thereby

摘要

A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.