发明名称 Location of extended linear defects
摘要 A method of locating a linear defect on a photographic element, the element having a useful imaging width and the defect aligned with length of the element, includes the steps of: exposing a region of the element to create a latent image which is substantially uniform across the useful imaging width of the element; developing the latent image to produce a density signal; sampling the density signal with a photometric device; and analyzing the sampled density data for the presence of significant deviations aligned with the length of the element to locate the defect.
申请公布号 US7113627(B1) 申请公布日期 2006.09.26
申请号 US20000635178 申请日期 2000.08.09
申请人 EASTMAN KODAK COMPANY 发明人 CAHILL NATHAN D.;SPENCE JOHN P.
分类号 G03C1/765;G06K9/00;H04N1/00;H04N1/409 主分类号 G03C1/765
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