发明名称 |
Location of extended linear defects |
摘要 |
A method of locating a linear defect on a photographic element, the element having a useful imaging width and the defect aligned with length of the element, includes the steps of: exposing a region of the element to create a latent image which is substantially uniform across the useful imaging width of the element; developing the latent image to produce a density signal; sampling the density signal with a photometric device; and analyzing the sampled density data for the presence of significant deviations aligned with the length of the element to locate the defect.
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申请公布号 |
US7113627(B1) |
申请公布日期 |
2006.09.26 |
申请号 |
US20000635178 |
申请日期 |
2000.08.09 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
CAHILL NATHAN D.;SPENCE JOHN P. |
分类号 |
G03C1/765;G06K9/00;H04N1/00;H04N1/409 |
主分类号 |
G03C1/765 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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