发明名称 |
Technique for ion beam angle process control |
摘要 |
A technique for ion beam angle process control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle process control in an ion implanter system. The method may comprise directing one or more ion beams at a substrate surface. The method may also comprise determining an average spread of incident angles at which the one or more ion beams strike the substrate surface. The method may further comprise adjusting the one or more ion beams based at least in part on the average spread of incident angles to produce a desired spread of ion beam incident angles.
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申请公布号 |
US2006208203(A1) |
申请公布日期 |
2006.09.21 |
申请号 |
US20050146064 |
申请日期 |
2005.06.07 |
申请人 |
GUPTA ATUL;OLSON JOSEPH C |
发明人 |
GUPTA ATUL;OLSON JOSEPH C. |
分类号 |
H01J37/302;H01J37/317 |
主分类号 |
H01J37/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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