发明名称 Method and device for irradiating spots on a layer
摘要 For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the optical element nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening through a total projected cross-sectional passage area in a plane parallel to the layer. The outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction perpendicular to the layer, the total cross-sectional area has a centre in the portion of the interspace through which the radiation irradiates the spot.
申请公布号 US2006209414(A1) 申请公布日期 2006.09.21
申请号 US20050539351 申请日期 2005.06.15
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V. 发明人 VAN SANTEN HELMAR;NEIJZEN JACOBUS H.M.
分类号 G02B1/10;G03F7/20;G11B7/12;G11B7/135;G11B7/26 主分类号 G02B1/10
代理机构 代理人
主权项
地址