Exposure device`s e.g. projector, focus correcting method for semiconductor manufacturing system, involves executing focus correction of illuminating devices based on focus values of devices for correcting dimensional accuracy of image

摘要

The method involves determining dimensions of structural components of musters, and determining difference values of the dimensions. Focus values of illuminating devices e.g. projectors, based on the difference values of the dimensions. Focus correction of the illuminating devices is executed based on the focus values for correcting dimensional accuracy of image for the illuminations. Independent claims are also included for: (a) a computer readable medium for executing a method for focus correction of an illuminating device (b) a semiconductor manufacturing system.