| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask capable of being made large in size by improving the strength of a silicon mask, which is made thin in thickness, and to provide a method of manufacturing the mask. SOLUTION: The mask M for depositing a thin film having a predetermined pattern with respect to a substrate for film deposition comprises a mask base material S consisting of silicon, a reinforcing base material H adhered to one main surface MB of the mask base material S to reinforce the mask base material S, and an opening part 24 formed through the mask base material S and the reinforcing base material H corresponding to the predetermined pattern. COPYRIGHT: (C)2006,JPO&NCIPI
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