发明名称 |
Semiconductor device and manufacturing method of the same |
摘要 |
A semiconductor device includes an N-type semiconductor region formed in a semiconductor substrate; a p-type semiconductor region formed in a region deeper in the semiconductor substrate than the N-type semiconductor region; and a heavy metal capturing region formed in a portion of the p-type semiconductor region to capture heavy metal ions. The heavy metal capturing region may be a P-type region. It is preferable that the diffusion speed of the heavy metal ions is slower in the heavy metal capturing region than in the p-type semiconductor region.
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申请公布号 |
US2006211170(A1) |
申请公布日期 |
2006.09.21 |
申请号 |
US20060376339 |
申请日期 |
2006.03.16 |
申请人 |
ELPIDA MEMORY, INC |
发明人 |
OYU KIYONORI;HAMADA KOJI;UCHIYAMA YASUHIRO;NISSA MITSUO |
分类号 |
H01L21/00;H01L23/06 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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