发明名称 Semiconductor device and manufacturing method of the same
摘要 A semiconductor device includes an N-type semiconductor region formed in a semiconductor substrate; a p-type semiconductor region formed in a region deeper in the semiconductor substrate than the N-type semiconductor region; and a heavy metal capturing region formed in a portion of the p-type semiconductor region to capture heavy metal ions. The heavy metal capturing region may be a P-type region. It is preferable that the diffusion speed of the heavy metal ions is slower in the heavy metal capturing region than in the p-type semiconductor region.
申请公布号 US2006211170(A1) 申请公布日期 2006.09.21
申请号 US20060376339 申请日期 2006.03.16
申请人 ELPIDA MEMORY, INC 发明人 OYU KIYONORI;HAMADA KOJI;UCHIYAMA YASUHIRO;NISSA MITSUO
分类号 H01L21/00;H01L23/06 主分类号 H01L21/00
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