| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition to be used for a semiconductor manufacturing process such as an IC, for manufacturing a circuit board of a liquid crystal, a thermal head or the like and for other photofabrication processes, and to provide a pattern forming method using the photosensitive composition, in particular, to provide a photosensitive composition having high exposure latitude, favorable PEB (post exposure bake) temperature dependency, and improved sensitivity and dissolution contrast in EUV exposure, and to provide a pattern forming method using the composition. <P>SOLUTION: The photosensitive composition contains a compound having a tricyano carbonium group which generates a specified organic acid by irradiation with actinic rays or radiation, and the pattern forming method is carried out by using the above photosensitive composition. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
