发明名称 |
Exposure apparatus and device manufacturing method |
摘要 |
An exposure apparatus projects a pattern image onto a substrate via a projection optical system and a liquid, and the projection optical system has an optical member that comes into contact with the liquid and an optical group arranged between the optical member and a reticle. A holding mechanism that holds the optical member and the optical group holds the optical member so that it is movable relative to the optical group.
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申请公布号 |
US2006209278(A1) |
申请公布日期 |
2006.09.21 |
申请号 |
US20060325332 |
申请日期 |
2006.01.05 |
申请人 |
NIKON CORPORATION |
发明人 |
KIUCHI TOHRU;MIYAKE TOSHIHIRO |
分类号 |
G03B27/42;G02B7/02;G03F7/20 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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