| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a high-density diamond-like carbon film, silicon film, germanium film, etc. SOLUTION: The method for manufacturing the film comprises forming the film on a base material by performing plasma discharge with respect to a mixed system of a compound including a group 14 element and a substance made into a supercritical state. Here, the group 14 element is carbon, and the formed film is preferably a diamond-like carbon film. Also, the group 14 element is silicon and the formed film is preferably a silicon film. Further, the group 14 element is a germanium atom and the formed film is preferably a germanium film. COPYRIGHT: (C)2006,JPO&NCIPI
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