发明名称 |
Automatic material handling system, production system for semiconductor device, and production management method for semiconductor device |
摘要 |
It is an object to provide an AGV that enables preventing a substrate and a manufacturing system from being contaminated due to another substrate with an adhering contaminant generated in a manufacturing process, and also a production system for a semiconductor device and a production management method for a semiconductor device, which use the AGV. In the present invention, air filtered through a filter is introduced into a containing portion of an AGV, and air in the containing portion containing a carrier is exhausted after filtering the air in the containing portion through another filter. As the filter used before discharging the air, a filter that enables filtering an impurity on the order of a submicron level is used. In addition, a carrier used before doping is changed to another carrier after doping, and CIM system is used to control driving of the AGV and selection of the carrier.
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申请公布号 |
US2006212152(A1) |
申请公布日期 |
2006.09.21 |
申请号 |
US20060436084 |
申请日期 |
2006.05.18 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
OHTANI HISASHI;TSUJI EIICHIRO |
分类号 |
B65G49/00;B65G49/07;H01L21/00;H01L21/02;H01L21/677 |
主分类号 |
B65G49/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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