发明名称 Automatic material handling system, production system for semiconductor device, and production management method for semiconductor device
摘要 It is an object to provide an AGV that enables preventing a substrate and a manufacturing system from being contaminated due to another substrate with an adhering contaminant generated in a manufacturing process, and also a production system for a semiconductor device and a production management method for a semiconductor device, which use the AGV. In the present invention, air filtered through a filter is introduced into a containing portion of an AGV, and air in the containing portion containing a carrier is exhausted after filtering the air in the containing portion through another filter. As the filter used before discharging the air, a filter that enables filtering an impurity on the order of a submicron level is used. In addition, a carrier used before doping is changed to another carrier after doping, and CIM system is used to control driving of the AGV and selection of the carrier.
申请公布号 US2006212152(A1) 申请公布日期 2006.09.21
申请号 US20060436084 申请日期 2006.05.18
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 OHTANI HISASHI;TSUJI EIICHIRO
分类号 B65G49/00;B65G49/07;H01L21/00;H01L21/02;H01L21/677 主分类号 B65G49/00
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