| 发明名称 |
Two-dimensional patterning method, electronic device using same, and magnetic device fabricating method |
| 摘要 |
A novel two-dimensional patterning method enabling two-dimension patterning without using any photosensitive material and ion milling, wherein a two-dimensional pattern is formed by destroying a blister provided on a substrate by electron or ion irradiation.
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| 申请公布号 |
US2006211258(A1) |
申请公布日期 |
2006.09.21 |
| 申请号 |
US20040566158 |
申请日期 |
2004.07.27 |
| 申请人 |
IGARASHI SHINICHI;NAKAMURA AKIKO;KITAJIMA MASAHIRO |
发明人 |
IGARASHI SHINICHI;NAKAMURA AKIKO;KITAJIMA MASAHIRO |
| 分类号 |
H01L21/302;H01L21/31;G11B5/127;H01L21/265;H01L21/3065;H01L21/469 |
主分类号 |
H01L21/302 |
| 代理机构 |
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