| 摘要 |
A method for manufacturing gold bumps includes providing a substrate including a patterned protective layer, which exposes at least a bonding pad, on a surface, covering a photo resist on the surface of the substrate, performing a photolithography process to pattern the photo resist for exposing a portion of the protective layer and the bonding pad, removing a portion of the protective layer, removing the photo resist, and performing a gold bumping process. The resulting thickness of the protective layer covering the bonding pad is smaller than the resulting thickness of the protective layer covering the substrate. |
