| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method using particulates capable of simplifying a process by forming a pillar or a hole using a material for arranging (forming) a pattern. SOLUTION: A mixture, which is prepared by mixing a water dispersible ultraviolet curable resin and polystyrene standard particulates 13, is applied to a substrate 11 by spin coating. After the moisture of the coating film on the substrate 11 is volatilized to form a surface layer comprising the polystyrene standard particulates 13, the surface layer is irradiated with ultraviolet rays to fix a resin layer 12. Next, the resin layer is heated and held for 30 sec using an oven of which the internal temperature is set to 90°C. The substrate thus formed is set to an centrifugal separator to be rotated at a speed of 2,000 rpm for 30 sec. COPYRIGHT: (C)2006,JPO&NCIPI |
