| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a mask blank suitable for use in a liquid immersion exposure technique or a polarized light illumination technique. <P>SOLUTION: The mask blank comprises a synthetic quartz glass substrate and a light shielding film laminated on a surface of the substrate and is for use in a semiconductor manufacturing technique or a semiconductor device manufacturing technique employing exposure light at≤200 nm wavelength. The mask blank has a birefringence of 1 nm or less per substrate thickness measured at a wavelength of 193 nm. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
