PROCESSING GAS SUPPLY DEVICE AND SUBSTRATE PROCESSING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a technology for supplying a large quantity of processing gas evaporated from processing liquid with high concentration. SOLUTION: An HMDS gas supply device 3 reduces the pressure in a tank 31 storing HMDS liquid. Consequently, evaporation of HMDS liquid stored in the storage tank 31 is accelerated and a large quantity of HMDS gas is supplied with high concentration. Furthermore, pressure in the storage tank 31 is reduced by utilizing ejector effect incident to the flow of nitrogen gas as carrier gas. The evaporated HMDS gas can thereby be supplied to a processing chamber while being mixed easily with nitrogen gas. COPYRIGHT: (C)2006,JPO&NCIPI