发明名称 TEST PIECE INSTALLATION ELECTRODE OF PLASMA PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To control a test piece accurately to a predetermined temperature by accurately measuring the pressure of heat transfer gas between the test piece and a flame spraying film. SOLUTION: A plasma processing apparatus includes a substrate 1 in which a cooling medium passage for pouring a cooling medium is formed inside, a heat transfer gas supply groove formed on the flame spraying film 2 formed in the above substrate front surface, and a heat transfer gas passageway 5 which is formed in the above substrate and communicates with the heat transfer gas supply groove. The test piece installation electrode of the plasma processing apparatus performs the electrostatic adsorption of the test piece laid in the heat transfer gas supply groove formation surface of the above flame spraying film, and holds it. The substrate 1 has a pressure nanometer 10 which is connected with the heat transfer gas passageway 5 formed in the above substrate 1, and measures the pressure of the heat transfer gas. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006253204(A) 申请公布日期 2006.09.21
申请号 JP20050064066 申请日期 2005.03.08
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHIRAYONE SHIGERU;OMOTO YUTAKA;TSUBONE TSUNEHIKO;ARAMAKI TORU
分类号 H01L21/3065;H01L21/205 主分类号 H01L21/3065
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