| 摘要 |
PROBLEM TO BE SOLVED: To provide a method suitable for forming a pair of interdigital electrodes with high alignment accuracy. SOLUTION: This interdigital electrode couple forming method is a method for forming a pair of interdigital electrodes (first and second interdigital electrodes) in a material base plate 70. The method includes: a process of forming a mask pattern 72 having a mask part 72a for the first interdigital electrode on a pre-mask pattern 71' formed on a silicon layer 70a and a mask part 72b for the second interdigital electrode on the silicon layer 70a; a process of forming a mask pattern 71 having the mask part 71a for the first interdigital electrode corresponding to the mask part 72a from the pre-first mask pattern 71' by etching using the mask pattern; and a process of etching the silicon layer 70a through the mask patterns 71, 72 to form a conductor part E1a of the first interdigital electrode masked with the overlapping mask parts 71a, 72a and a residual mask part 70a' masked with the mask part 72b. COPYRIGHT: (C)2006,JPO&NCIPI
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