发明名称 EXPOSURE DEVICE AND METHOD, AND ELECTRO-OPTICAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device and method which prevent a liquid crystal mask from degrading due to heat and light, when being exposed, and also to provide an electrio-optical device. <P>SOLUTION: This exposure method includes: transferring a predetermined pattern to a photosensitive material 42 on a substrate 1 by using a liquid crystal mask 8; separating the light emitted from a light source 5 in a predetermined wavelength range into a 1st light 44, having a wavelength band in the visible light range and a 2nd light 46, having a wavelength band outside the visible light range by using a spectroscopic means 7; and radiating the 1st light 44 to the liquid crystal mask 8. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006251443(A) 申请公布日期 2006.09.21
申请号 JP20050068685 申请日期 2005.03.11
申请人 SEIKO EPSON CORP 发明人 NAKANO TOMOYUKI;YAMADA KATSUMI;ASAMI KENICHI;WAKABAYASHI JUNICHI
分类号 G03F7/20;G02F1/13;H01L21/027 主分类号 G03F7/20
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