发明名称 MASKLESS EXPOSURE APPARATUS, EXPOSURE METHOD THEREOF, AND METHOD FOR MANUFACTURING WIRING BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a maskless exposure apparatus that achieves maskless direct exposure on a general-use photosensitive resin with a high throughput and no defect, and to provide an exposure method and a method for manufacturing a wiring board. <P>SOLUTION: The maskless exposure apparatus is equipped with: a main irradiation optical system 3 which emits UV exposure light; an exposure head 30 which includes a light modulating optical system 5 modulating the emitted UV exposure light by each pixel to form a desired exposure pattern, and an imaging optical system 7 imaging the desired exposure pattern on the surface of an exposure object; a scanning means 2 which relatively scans the surface of the exposure object with the desired exposure pattern imaged by the imaging optical system of the exposure head; and a color tone measuring means 12 which measures tone pattern data on the surface of the exposure object. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006250982(A) 申请公布日期 2006.09.21
申请号 JP20050063411 申请日期 2005.03.08
申请人 HITACHI VIA MECHANICS LTD 发明人 YAMAGUCHI YOSHIHIDE;KOYAMA HIROSHI
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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