| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a stencil mask which is easily reduced in thickness, controlling stress applied on it, high in processability, and high in mechanical strength, excellent in pattern accuracy, and high in electron beam irradiation characteristics, and also to provide its manufacturing method. <P>SOLUTION: The stencil mask is equipped with: a board; and a mask mother body which is supported by the board and equipped with a penetration hole pattern through which a charged particle beam penetrates. The mask mother body is formed of a diamond film which has a peak strength ratio of a crystal plane (mirror index) (220) to a crystal plane (111), or 220/111, is 0.4 or below wherein the peak strength ratio is obtained by X-ray diffraction. The diamond film is formed on the board through a CVD method wherein a material gas containing hydrocarbon, hydrogen, and nitrogen source gas is used, and a flow rate of nitrogen to hydrocarbon is set at 6 or above to 100. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
